Equipment has been purchased under this grant to develop and build a research electron beam lithography (EBL) system at Stony Brook for the support of research projects on superconducting electronics. The system is based on an Array scanning electron microscope (SEM) which has been modified to accept a laser interferometer to monitor stage position. High precision nonmagnetic stages have been added, and interface electronics have been designed and built to permit control of the beam position and beam blanking by an external computer. The completed system is designed to write over a four inch wafer with a resolution of 30nm and a positional accuracy of 100nm.

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